Royalty Report: Semiconductors, Fabrication, Scientific & Technical Instruments – Collection: 29174

$100.00

Curated Royalty Rate Report
Category: Technology Licenses, Created On: 2022-04-28, Record Count: 3

Description

This collection of transactions and supporting information was developed using our AI algorithm to curate similar royalty reports into a cohesive collection to support your licensing, transfer pricing or other transaction scenarios where documented royalty rates and/or deal terms are important.
Category: Technology Licenses
Created On: 2022-04-28
Record Count: 3

Primary Industries

  • Semiconductors
  • Fabrication
  • Scientific & Technical Instruments
  • Lithography

IPSCIO Report Record List

Below you will find the records curated into this collection.  This summary includes the complete licensed property description so that you can review and determine if this collection covers the topics, technology or transaction type that is relevant for your needs.  The full report will include all relevant deal data such as the royalty base, agreement date, term description, royalty rates and other deal terms.  For reference, here is a sample of a full IPSCIO curated royalty rate report: Sample Report

IPSCIO Record ID: 29174

License Grant
The Licensor granted the Japanese Licensee, an exclusive, royalty bearing, nontransferable right and license during the term of this Agreement in the territory of Japan, to use Licensor's patents, copyrights, mask work rights and proprietary information with respect to the Product, a excimer laser, the primary market for which is for use in DUV photolithography equipment for manufacturing deep-submicron semiconductor devices.

Licensor hereby grants to Licensee the right to use Licensor's trademarks, provided that any use of Licensor's trademarks by Licensee shall be subject to prior approval of Licensor. Any use by Licensee shall be subject to revocation by Licensor if Licensor determines that the quality of Product manufactured by Licensee is not as good or better than that manufactured by Licensor.

License Property
The Licensor is the world's leading supplier of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems used in the manufacture of semiconductors.
Field of Use
Licensee is granted rights for use in DUV photolithography equipment for manufacturing deep-submicron semiconductor devices.

IPSCIO Record ID: 6873

License Grant
The Company of Israel  signed a technology-License Agreement, whereby the Company received a patent usage right as well as equipment from an undisclosed Licensor.
License Property
Metrology systems measure various thin film properties, critical circuit dimensions and layer-to-layer circuit alignment, known as overlay, during various steps in the semiconductor manufacturing process, allowing semiconductor manufacturers to increase quality, productivity and yields, lower their manufacturing costs and increase their profitability
Field of Use
The Licensee is a worldwide leading designer, developer and producer of integrated process control metrology systems used in the manufacture of semiconductors and a leading designer, manufacturer and producer of stand-alone process control metrology systems.

IPSCIO Record ID: 315856

License Grant
Licensor grants an exclusive license for the life of the patents to use, import, export, sell and offer to sell, but not to make, any Licensor Materials supplied or developed under this Agreement, only in the Field.
License Property
Photomasks are high-purity quartz or glass plates containing precision images of integrated circuits and are used as masters by semiconductor manufacturers to optically transfer these images onto semiconductor wafers. Photomasks are a necessary component in the production of semiconductors.

Licensor is currently the only photomask manufacturer in the world that also manufactures photoblanks and pellicles, the principal components of photomasks.

Field of Use
The field is the area of advanced photomask technology, such as photomasks, blanks and pellicles.  The technology is used in photolithography for microelectronic applications, including pellicles for optical markets, and specifically the semiconductor industry.
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