Royalty Report: Semiconductors, Fabrication, IC – Collection: 286101

$150.00

Curated Royalty Rate Report
Category: Technology Licenses, Created On: 2022-04-28, Record Count: 10

Description

This collection of transactions and supporting information was developed using our AI algorithm to curate similar royalty reports into a cohesive collection to support your licensing, transfer pricing or other transaction scenarios where documented royalty rates and/or deal terms are important.
Category: Technology Licenses
Created On: 2022-04-28
Record Count: 10

Primary Industries

  • Semiconductors
  • Fabrication
  • IC
  • Chemicals
  • Metals & Metal Products
  • Coating
  • Material Composite

IPSCIO Report Record List

Below you will find the records curated into this collection.  This summary includes the complete licensed property description so that you can review and determine if this collection covers the topics, technology or transaction type that is relevant for your needs.  The full report will include all relevant deal data such as the royalty base, agreement date, term description, royalty rates and other deal terms.  For reference, here is a sample of a full IPSCIO curated royalty rate report: Sample Report

IPSCIO Record ID: 286101

License Grant
Licensor grants to Licensee, effective upon (and only upon) a Triggering Event, an exclusive, royalty bearing, transferable license to make, have made, use, offer to sell, sell or import Particles for applications in the Field under U.S. patent no. 6,669,823 and all corresponding foreign patents and patent applications, and any trade secrets or other intellectual property owned or controlled by Licensor or its principals relevant to manufacture of Particles in the Field.

Licensor will sell, and Licensee will purchase, all of Licensee’s worldwide requirements for Ceria Particles for applications in the Field. In addition, if, pursuant to Licensee’s request, Licensor develops and produces Other Particles for applications in the Field that meet Licensee’s performance and pricing criteria, Licensor will sell, and Licensee will purchase, all of Licensee’s worldwide requirements for such Other Particles for applications in the Field at a price to be negotiated and agreed by the parties and otherwise on the terms and conditions set forth herein.

For Ceria Particles, the purchase and sale obligations set forth shall be mutually exclusive; i.e., except as specifically otherwise provided herein, for the term of this Agreement,

In consideration of the foregoing premises and the mutual covenants and promises hereinafter set forth, the parties agree as follows
(a)

Licensor and Licensee mutually agree to use all commercially reasonable efforts to cooperate with one another to develop one or more commercial slurry products incorporating the Particles for applications in the Field (the Development Product(s)).
(b)

Without limiting Licensee’s general obligation of cooperation under subsection (a), above, Licensee undertakes to (i) provide Licensor with target specifications, performance data and analytical assistance as may be agreed to characterize Development Product performance, (ii) test and evaluate Development Product samples provided by Licensor and provide feedback as to the results thereof to Licensor in a timely manner, (iii) keep Licensor regularly advised of the general market situation applicable to the Development Products, and (iv) include Licensor business and technical personnel in meetings with business and technical personnel at customers, as appropriate, to discuss and promote the Particles and the Development Products.
(c)

Without limiting Licensor’s general obligation of cooperation under subsection (a), above, Licensor undertakes to (i) provide Licensee with reasonable research samples of the Development Product for testing and evaluation as may be agreed, together with related physical, chemical and other information, (ii) devote sufficient resources (including equipment and personnel) as may be agreed to provide for the development effort, and (iii) provide agreed technical support to Licensee and its customers as to the use of the Particles and the Development Products.

License Property
Particles are cerium oxides particles (ceria) and/or dispersions of Ceria using Licensor’s proprietary processes.

6,669,823 – Process for preparing nanostructured materials of controlled surface chemistry

Other particles and/or dispersions (nanocrystalline or otherwise) developed and manufactured by Licensor using its proprietary processes for use in the Field (such other particles and/or dispersions developed and manufactured by Licensor for use in the Field being hereinafter referred to as Other Particles, and Ceria Particles and Other Particles developed and manufactured by Licensor being hereinafter together referred to as the Particles)

Field of Use
The Field is for potential use by Licensee in products for chemical mechanical planarization (CMP) for semiconductor wafers.

IPSCIO Record ID: 27456

License Grant
The Company licensed certain trademarks and technology, and granted to a company headquartered in Kanagawa Prefecture, Japan the exclusive right to manufacture and sell in Japan, Korea, Taiwan, Hong Kong, China, India, the Philippines, Thailand, Vietnam, Malaysia, Singapore and Indonesia, and such other countries as the parties may agree to from time to time, products similar to those manufactured and distributed by the Company.
License Property
The Company designs, develops, manufactures, markets and services chemical mechanical planarization, or CMP, systems used in the fabrication of semiconductor devices as well as other high throughput precision surface processing systems used in the fabrication of thin film memory disk media, semiconductor wafers and general industrial components; products include polishing, grinding and lapping equipment and systems; cleaning systems; other high precision surface processing equipment; and certain other products used in its customers’ manufacturing process, including slurries.

IPSCIO Record ID: 328

License Grant
Japanese Licensor hereby grants to Licensee the exclusive License under the Patents, Technical Information and Intellectual Property Rights to manufacture, use, offer for sale, sell, import and/or lease the Products in the territory; provided, however, Licensee agrees not to manufacture any of the three Products listed in this Agreement at any time on or prior to June 30, 2006; provided further, however, that Licensee may start on the effective date to manufacture, use, offer for sale, sell, import and/or lease in the territory all subsystems related to any Products, including, but not limited to, the Nison Vesper submodule. For the avoidance of doubt, Licensor acknowledges and agrees that the License granted to Licensee under this Agreement includes the right of the Licensee to subLicense to any purchaser of the Products the right to use (but not manufacture) the Patents, Technical Information and Intellectual Property Rights.
License Property
Licensor was incorporated to, among other things, manufacture and distribute certain products and systems of Licensee in Japan in accordance with a Shareholders Agreement dated June 5, 1991.  This license is a result of Licensor buying a portion of the business of a semiconductor manufacturing equipment business and licensing back rights to Licensee.

The parties agree that the definition of Products includes subsystems related to the products (e.g. the Nison Vesper submodule) only to the extent such subsystems are incorporated in Products sold by Licensee to end-users of the Products and not to original equipment manufacturers.  Three products are covered by this agreement Spin Processor CENOTE, a single wafer wet station; Best, a wafer backside3 etcher, and Wet Station, an immersion process system.

Patent

Title
No.
number

number
Country

1
Method of recirculation of high temperature etching solution
63–248757
02–096334

1653241
Japan

2
Cleaning/ rinsing vessel for semiconductor wafer
03–350731
05–166787

2013691
Japan

3
Method for refinig etchant
05–253672
07–086260

3072876
Japan

4
Single wafer spin etching method
07–104581
08–279485

3459137
Japan

5
Etching method with hot phosphoric acid
07–216528
09–045660

3459141
Japan

6
Composition measuring method for buffered hydrofluoric acid for semiconductor wafer etching
07–163075
08–334461

N/A
Japan

7
Regeneration treatment apparatus for etchant and etching apparatus using the same
10–095836
11–293479

N/A
Japan

8
Cleaning apparatus
11–199868
2001–028356

N/A
Japan

9
Filter device with bellows damper and chemical–circulation treatment device for semiconductor wafer using the same
11–222204
2001–046815

N/A
Japan

10
Semiconductor wafer cleaning system
11–234855
2001–060574

N/A
Japan

11
Method of etching semiconductor wafer
11–271065
2001–093876

N/A
Japan

12
Device and method for etching semiconductor wafer
11–314794
2001–135611

N/A
Japan

13
Scrub cleaning device
2000–044343
2001–237209

N/A
Japan

14
Cleaning Equipment of wafer
2000–274592
2002–093764

N/A
Japan

15
Equipment and method for processing solution for semiconductor wafer
2001–009915
2002–217165

N/A
Japan

16
Wafer–cleaning device
2001–158580
2002–353183

N/A
Japan

17
The apparatus and the method of etching wafer
2002–42120
2003–243353

N/A
Japan

18
The apparatus of reclaiming etching liquid and method and apparatus of etching
2002–269405
N/A

N/A
Japan

19
The method of controlling the boiling chemical
2002–318730
2004–153164

N/A
Japan

20
The apparatus and the method of floating wafer chuck
2002–108651
2003–303871

N/A
Japan

21
The apparatus of wafer treatment and shaft
2003–47148
N/A

N/A
Japan

22
Etching method and equipment
2002–324795
2004–158746

N/A
Japan

23
Processing method and processing device before wafer inspection
2001–266653
2003–75312

N/A
Japan

24
Processing method and processing device before wafer inspection
2002–156835
2003–344243

N/A
Japan

25
Method for recirculating high–temperature etching soluthin
412444
N/A

4980017
USA

26
Method for purification of etching solution
305334
N/A

5470421
USA

Trademarks

Class of

NO
Trademark
goods
Designated goods

1 NISON
7
The apparatus of filtering recirculation etching liquid and other chemical machines and instruments

2 NISON
9
Automatic fluid– composition control machines and instruments

3 CENOTE
7
The apparatus of wafer etching, chemical machines and instruments

4 Stelna
7
The machines of chemical reaction and machines of separation, the chemical reclaiming etching apparatus, and other chemical machine and instruments.

Remark An application shall designate one or more items of goods on which the trademark is to be used, in one class of the classification of goods, prescribed by Cabinet Order.

Product
Product Name

Description

Spin Processor CENOTE
Single Wafer Wet Station

Best

                Wafer Backside Etcher

Wet Station

Immersion Process System

Field of Use
Products means any and all products, systems and subsystems now or hereafter produced by or under control of Licensee based upon the Technical Information given under this Agreement which are in the field of surface conditioning, cleaning, etch and stripping technology such as the Technical Information used in the products to this Agreement and any products, systems and subsystems to be used in the Field which will be developed, designed or invented, or otherwise acquired by Licensor in the future during the term of this Agreement.

IPSCIO Record ID: 227276

License Grant
The Parties have agreed to transfer and to license certain patents relating to wafer and/or reticle containers, Ports, material handling systems and/or Tracking Systems.  

Licensor hereby sells, assigns, transfers and otherwise conveys to Licensee Cayman the entire right, title and interest in and to the specific Patents and Applications identified and any foreign counterparts, and all other patents or applications that now or in the future claim priority to any Patent or Application identified.

Licensee and Licensee Cayman grant to Licensor and Licensors Subsidiaries a world-wide, fully paid, exclusive, non-transferable license, including the right to grant sublicenses, under all Exclusive Rights Patents owned or licensable by Licensee Cayman or Licensee to make, have made, use, sell, offer to sell, import, export, and otherwise dispose of, anywhere in the world, all products except Acquired Products.

Licensor grants to Licensee Cayman a a world-wide, fully paid, exclusive, non-transferable license, including the right to grant sublicenses, under all Combined Pod and Port Patents owned or licensable by Licensor to make, have made, use, sell, offer to sell, import, export, and otherwise dispose of, anywhere in the world, Acquired Products.

Licensee Cayman and Licensee grant to Licensor and Licensors Subsidiaries a a world-wide, fully paid, nonexclusive, non-transferable license under Pod and Carrier Patents owned or licensable by Licensee Cayman or Licensee to (a) conduct development, research, testing, or demonstration of Acquired Products, provided that Licensor does not transfer Acquired Products to third parties for purposes other than development, research, testing, or demonstration, and (b) to make, have made, use, sell, offer to sell, import, export, and otherwise dispose of, anywhere in the world, Non-Plastic Flat Panel Display Products.

Licensee Cayman and Licensee grant to Licensor and Licensors Subsidiaries a a world-wide, fully paid, nonexclusive, non-transferable license under all Port Patents, MHS Patents, Environmental Control Patents, and AutoID/Lot Tracking Patents owned or licensable by Licensee Cayman or Licensee to make, have made, use, sell, offer to sell, import, export, and otherwise dispose of, anywhere in the world, all products except Acquired Products.

Licensor grants to Licensee Cayman a a world-wide, fully paid, nonexclusive, non-transferable license under Pod and Carrier Patents, MHS Patents, Environmental Control Patents, and AutoID/Lot Tracking Patents owned or licensable by Licensor to make, have made, use, sell, offer to sell, import, export, and otherwise dispose of, anywhere in the world, Acquired Products.

License Property
Licensed Trademarks means the marks ASYST(R), A S Y S T(R), and A(R).

Pod and Carrier Patents means United States and foreign patents issued on or before the seventh anniversary of the Effective Date having claims directed to sealable, transportable containers, wafer and/or reticle carriers and containers, or components of wafer and/or reticle carriers and containers, including, but not limited to, the patents identified below.

US 4,739,882 – Container having disposable liners
US 4,815,912 – Box door actuated retainer
US 4,995,430 – Sealable transportable container having improved latch mechanism

Combined Pod and Port Patents means United States and foreign patents issued on or before the seventh anniversary of the Effective Date having claims directed to (a) the combined structure of a wafer or reticle container and a Port or (b) the operation of a wafer or reticle container and a Port, including, but not limited to, the patents identified.

Port Patents means United States and foreign patents issued on or before the seventh anniversary of the Effective Date having claims directed to the structure and/or operation of a Port.

MHS Patents means United States and foreign patents issued on or before the seventh anniversary of the Effective Date having claims directed to the structure and/or operation of a material handling system for transporting, storing, delivering and/or loading wafer and/or reticle containers or individual wafers in the manufacture of semiconductor devices, or components of such a system.

Environmental Control Patents means United States and foreign patents issued on or before the seventh anniversary of the Effective Date having claims directed to environmental control features of Ports for controlling the environment inside of wafer and/or reticle containers, including purging systems, including, but not limited to, the patents identified in this Agreement; provided, however, that Environmental Control Patents do not include patents with claims principally directed to environmental control features within wafer and/or reticle containers.

Autoid/Lot Tracking Patents means United States and foreign patents issued on or before the seventh anniversary of the Effective Date having claims principally directed to systems or components of systems used to track, identify, manage, control and route lots, carriers, wafers and/or reticlesduring the manufacture of semiconductors or semiconductor wafers, including, but not limited to, the patents identified.

Licensed Patents means Pod and Carrier Patents, Port Patents, Combined Pod and Port Patents, MHS Patents, Environmental Control Patents, and AutoID/Lot Tracking Patents.

Exclusive Rights Patents means the Patents and Applications identified in this Agreement and all foreign equivalents and counterparts, divisions, continuations, continuations-in-part, reexaminations, and reissues of such Patents and Applications.

Field of Use
This agreement pertains to the semiconductor industry.

IPSCIO Record ID: 202872

License Grant
Licensor agrees to grant twenty (20) compiler tokens to the Singapore Licensee.
License Property
The licensed property is wafer manufactured at Licensee that incorporates any Licensee/Licensor 0.35um/0.25um memory compilers or wafers.

The memory compilers included are
• 0.35nm process
(i) 1 port High density compiler
• 0.25nm process
(i) 1 port High Density compiler (HD-Family)
(ii) 2 port High density compiler (HD-Family)
(iii) 1 port Register file
(iv) 2 port Register file

Field of Use
This agreement is for the semiconductor industry.

IPSCIO Record ID: 27206

License Grant
The Company agrees to grant to a Korean company the right to a processes involving technology, equipment design, and other intangible assets and property rights of value, all of which are useful with respect to the manufacture of Silicon Wafers.
License Property
The Company has developed over the years and possesses processes involving technology, equipment design, and other intangible assets and property rights of value, all of which are useful with respect to the manufacture of Silicon Wafers (as hereinafter defined) and certain value added features such as epitaxial layers.
Field of Use
Field of this Agreement means Silicon Wafers and processes, apparatus, equipment, and materials useful in producing Silicon Wafers consistent with the commercial requirements of PHC.

The Field of this Agreement shall not include processes, apparatus, equipment, and materials useful in producing polycrystal Silicon.

IPSCIO Record ID: 27127

License Grant
The Company hereby grants to Japanese company the exclusive right and license, with no right to sublicense, to use the Information to manufacture, use and sell NTC Product.
License Property
NTC Product shall be any nanocrystalline materials made using the Information. Applications are all applications except cosmetics, skin care and chemical/mechanical planarization of metal layers on semiconductor wafers. Information shall mean US patent Nos. 5,460,701 and 5,514,349 and any foreign counterpart applications (hereinafter collectively called Patents).

IPSCIO Record ID: 280974

License Grant
Licensor and German Licensee are parties to certain litigation involving the 761 patent.

With this interim patent license, the Licensor grants to the German Licensee a non-exclusive, non transferable worldwide license under the Patent Rights, without the right to grant sublicenses, to make, have made, use, sell, offer for sale, and import Licensed Products during the Term of this Agreement.

License Property
Licensor is the owner of patents relating to wet processing of semiconductors.

Licensed Products shall mean drying equipment, wet bench products, and replacement parts .

Dryer Module shall mean drying equipment in an enclosed, self-contained, physically separate unit which performs rinsing and drying but no chemical treatment operation.

Field of Use
The field of use is the semiconductor wet processing business.

IPSCIO Record ID: 286107

License Grant
Licensor hereby grants to Chinese Licensee a personal, royalty-bearing, internal, non-transferable, non-sublicensable, license under Licensors Intellectual Property Rights in and to the Licensor Product Technology to
(a) make (but not have made), in each case solely at the Licensee Facility, Licensed Products;
(b) sell and offer for sale Licensed Products, and deliver such Licensed Products solely to customers in Greater China for end use in products solely for sale and use in Greater China;
(c) make a reasonable number of copies of the Licensor Product Technology, other than the Licensor Maskworks, as necessary to exercise the license above and to test the Licensed Products; and
(d) Subject to Licensors prior written approval to use, copy and distribute certain non-confidential Licensor documents in connection with the marketing and sale by Licensee of Licensed Products.
License Property
Licensor Product Technology means the Licensor Maskworks, and copies of any Licensor Product information and specifications, testing requirements and procedures and any other Technology, in each case provided by Licensor to Licensee under this Agreement for purposes of Product Qualification, or the manufacturing and testing of Licensor Products and/or Licensed Product under the Product License Agreement.

Licensed Products means those semiconductor devices manufactured by Licensee using the Licensor Maskworks and other Licensor Product Technology that are sold in wafer, die or packaged form as part of a Licensee product, excluding in all cases any Licensor Product.

Licensor Maskworks means those specific Maskworks sets provided or to be provided by Licensor to Licensee as set forth in this agreement to include but not limited to Ultratech-based Mask Sets and Nilon-based Mask Sets.

Intellectual Property Rights means the United States and foreign rights associated with the following (i) patents and patent applications (Patent Rights); (ii) copyrights, copyright registrations and applications therefor (Copyrights); (iii) Maskworks, Maskwork registrations and applications therefor (Maskwork Rights); (iv) trade-secret rights and all other trade secret or similar proprietary rights in confidential business or technical information (Trade Secret Rights); and (v) any similar, corresponding or equivalent rights to any of the foregoing any where in the world. For purposes of this Agreement, Intellectual Property Rights excludes any United States and foreign rights associated with Trademarks.

Licensor is engaged in the business of designing, manufacturing and marketing high performance, analog integrated circuits that are used primarily by original equipment manufacturers operating in the computing, consumer electronics, communications and networking infrastructure markets.

Field of Use
This agreement covers foundry manufacturing, product licenses, process technology transfers and fab equipment sales.

Licensee is an integrated circuit design company focused on integrated circuits used in audio/video equipment and other consumer products in China.

IPSCIO Record ID: 230774

License Grant
The Parties agree to jointly develop semiconductor manufacturing process technology based on Licensor’s “S” high performance technology roadmap on commercially available wafers that meet the requirements (referred to as Strategic Technology Objectives) in accordance with the schedule (hereinafter referred to as Development Schedule). The Parties agree that the process technology so developed, shall be high performance, leading edge technology and, to the extent consistent with the Strategic Technology Objectives, shall be cost efficient. Any modification to such Strategic Technology Objectives or Development Schedule requires the mutual agreement of the Parties. For the avoidance of doubt, none of the Process Development Projects shall include the development of i) Proprietary Tools, ii) Packaging Technology, iii) Mask Fabrication and Photoresist Technology, iv) Memory, v) SiGe Technology, vi) Chip Designs, or vii) Post-Silicon Devices.
License Property
Semiconductor Product means a component that contains an Integrated Circuit on a single or multichip module that incorporates a means of connecting those Integrated Circuits with other electronic elements (active or passive) and/or means to make external electrical connections to such elements, but which excludes any means for a user to operate the functions therein (e.g., buttons, switches, sensors).

Licensed Product means Integrated Circuits that include Bulk CMOS Information, Industry Standard Information, High Performance Device Information, SOI Device Information, or any combination thereof, other than Foundry Products.

Integrated Circuit means an integral unit formed on a semiconductor substrate including a plurality of active and/or passive circuit elements formed at least in part of semiconductor material. For clarity, Integrated Circuit shall include charge-coupled devices (“CCDs”).

Bulk CMOS Information means those aspects of Background Know-How and Specific Results that are (i) directed to Lithography and BEOL, and/or (ii) selected by Licensor either for incorporation into an Licensor Bulk CMOS process or otherwise pursuant to this agreement.

Industry Standard Information means those aspects of Background Know-How and Specific Results that are (i) directed to Lithography and BEOL, or (ii) applicable to Industry Standard CMOS and selected by Licensor either for incorporation into an Licensor Industry Standard CMOS process or otherwise selected pursuant to this agreement.

High Performance Device Information means Background Know-How and Specific Results pertaining to all process methods, steps, and structures created on substrates, not including SOI Device Information. Bulk CMOS Information or Industry Standard Information.

SOI Device Information means Background Know-How and Specific Results pertaining to all process methods, steps, and structures created on commercially available SOI Wafers other than Bulk CMOS or Industry Standard Information.

Field of Use
This agreement pertains to the semiconductor industry.
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