Royalty Report: Semiconductors, Fabrication, Material Composite – Collection: 28084


Curated Royalty Rate Report
Category: Technology Licenses, Created On: 2022-04-28, Record Count: 6


This collection of transactions and supporting information was developed using our AI algorithm to curate similar royalty reports into a cohesive collection to support your licensing, transfer pricing or other transaction scenarios where documented royalty rates and/or deal terms are important.
Category: Technology Licenses
Created On: 2022-04-28
Record Count: 6

Primary Industries

  • Semiconductors
  • Fabrication
  • Material Composite
  • Electrical & Electronics
  • Coating
  • Technical Know How
  • Chemicals
  • Metals & Metal Products
  • Battery

IPSCIO Report Record List

Below you will find the records curated into this collection.  This summary includes the complete licensed property description so that you can review and determine if this collection covers the topics, technology or transaction type that is relevant for your needs.  The full report will include all relevant deal data such as the royalty base, agreement date, term description, royalty rates and other deal terms.  For reference, here is a sample of a full IPSCIO curated royalty rate report: Sample Report

IPSCIO Record ID: 28084

License Grant
The University grants to Licensee an Exclusive License, under the University's Intellectual Property to make, have made, use, offer for sale, sell, lease or otherwise transfer Licensed Product(s) in the Field of Use in the Territory during the Term of Agreement. Licensee shall have the right to grant sublicenses.
License Property
The University is the owner of certain inventions, know-how and rights pertaining to the controlled deposition of silicon oxide on silicon from an aqueous solution at ambient temperature and pressure.

Provisional Patent Application “Method for Low Temperature Growth of Inorganic Materials from Solution using Growth and Re-Growth”.

Field of Use
Field of Use means the deposition of silicon oxide for microelectronic, optoelectronic and micromechanical applications on silicon in any crystallographic form, as well as on metals, glasses, ceramics and plastics, and for thermomechanical and decorative uses on metals, glasses, ceramics and plastics.

IPSCIO Record ID: 89738

License Grant
Licensor and their Netherlands Affiliate hereby grants to Licensee and its Affiliates for the Term a nonexclusive license, with the right to sublicense, under the Licensed Claims to develop, make, have made, use, sell, offer to sell, lease, and import Licensed Products in the Territory and to develop and perform Licensed Processes in the Territory. Nothing in this Agreement is intended to grant a license to anyone to make, use, sell, offer to sell, lease, or import Equipment that infringes any patent owned by Licensor.
License Property
Licensed Product shall mean products comprising Permitted Structures that absent the license granted hereunder, would infringe one or more Licensed Claims.

Licensed Claims shall mean any and all non-Equipment claims entitled to priority to U.S. Serial No. 09/227,679 and/or 60/070,991, including, without limitation, non-Equipment claims in U.S. Patent Nos. 6,749,687 and 7,105,055.

6,749,687 –  In situ growth of oxide and silicon layers
7,105,055 – In situ growth of oxide and silicon layers

The lead technology, named Mears Silicon Technology™, or MST®, is a thin film of reengineered silicon, typically 100 to 300 angstroms (or approximately 20 to 60 silicon atomic unit cells) thick. MST® can be applied as a transistor channel enhancement to CMOS-type transistors, the most widely used transistor type in the semiconductor industrry.

Field of Use
This agreement pertains to the semiconductor industry.

IPSCIO Record ID: 153750

License Grant
Licensor grants to Licensee an exclusive, nontransferable, worldwide right and License to use the Licensor Industrial Property Rights solely for the  manufacture, sale, lease, or other disposition of products incorporating the Licensed Technology.  Licensor further grants to Licensee an exclusive, nontransferable right to (i) modify and make derivative works from the Licensor Industrial Property and (ii) subject to the prior written consent of Licensor, which shall not be unreasonably withheld, sublicense the Licensor Industrial Property rights solely for the purposes of manufacture, product development, distribution or related uses.
License Property
The Business shall mean the Intragene and related coating business acquired by Licensee pursuant to the terms of the Purchase Agreement and now operated by Licensee.

Licensor Industrial Property Rights shall mean all Confidential Information and, whether or not the following constitute Confidential Information, all of Licensors patents, licenses, trademarks, trade names, inventions, inventors notes, copyrights, formulea know-how, trade secrets, drawings and designs relating to the Business represented by the Licensed Technology.

Licensed Technology shall mean all of Licensors proprietary technology relating to the Business which has been licensed to Licensee hereunder including, but not limited to, the Patents and the Marks.

The Marks means the trademark 'Licensor Materials' and all trade or service mark registrations (and any applications therefor) associated therewith.

Patents shall mean the following patents (i) U.S. Patent 4,535,029 dated 8/13/85, (ii) U.S. Patent 4,426,423 dated 11/17/84, (iii) U.S. Patent 4,358,506 dated 11/9/82, (iv) U.S. Patent 4,376,806 dated 3/15/83 and (v) U.S. Patent 4,396,677 dated 8/2/83.

4,535,029 – Method of catalyzing metal depositions on ceramic substrates
4,426,423 – Ceramic, cermet or metal composites
4,358,506 – Metal and carbon composites thereof
4,376,806 – Highly adhesive coatings for beryllia
4,396,677 – Metal, carbon, carbide and other composites thereof

The Intragene-TM- process is a proprietary methodology developed by metallurgists and materials scientists at the Company and has been granted six U.S. patents as well as national phase patents based on two European patent applications and three Japanese patents. The Intragene-TM- process facilitates the ability to metallize, solder or braze a wide range of engineering ceramics, graphite and refractory metals.

The materials division product line consists of Intragene-TM–based sputtering target assemblies and electromagnet systems. The sputtering target assemblies have been sold into the rigid disk market since 1986 and are considered one of the most reliable such assemblies in the market today. Sputtering target assemblies are sold to end-users as source materials for coating other materials via a vacuum-based process called sputtering. Sputtering is employed as the primary method for depositing thin film functional and protective layers on rigid magnetic media (hard disks), as well as in many semiconductor-manufacturing operations. Once a target is made, it must usually be incorporated into the sputtering apparatus by joining it to a backing plate to make sound electrical, thermal and mechanical contact. The bonding of a target to the backing plate, which is usually made of copper, forms what is known as the 'bonded target assembly.'

Field of Use
This agreement pertains to the chemical industry relating to the coating technology.

IPSCIO Record ID: 28059

License Grant
In this agreement, Licensor grants an exclusive Worldwide License, with the right to sub license, under proprietary MPECVD Technology and Improvement Inventions to use the MPECVD Technology and Improvement Inventions and make, use and sell the Products.
License Property
The proprietary technology is relating to microwave plasma enhanced chemical vapor deposited or MPECVD, multi-layered optical coatings.
Field of Use
The Products produced for sale as coatings in display applications (CRT’s, Flat Panel Displays, Digitizers, Touch panels, etc) and coatings for flexible substrate applied to automotive and building glass and decorative and reflector applications, and for non low emissivity coatings on automotive and building glass, decorative and reflector glass applications.

IPSCIO Record ID: 332510

License Grant
Canadian Licensor sold the intellectual property rights to the new system to Licensee covering the PUREVAP Nano Silicon Reactor development program and the future commercialization of nano silicon materials made with this new, proprietary and low cost manufacturing process.  Licensor has retained a royalty-free, exclusive, irrevocable, worldwide license to use the new system for all purposes other than the manufacturing of nano silicon powders and wires.
License Property
The process, which is under development, is designed to transform silicon into spherical silicon nanopowders and nanowires for use in lithium-ion batteries.

PUREVAP is a patent pending one-step proprietary process that is being developed by the Licensor that uses a plasma arc within a vacuum furnace to produce high purity metallurgical grade silicon and solar grade silicon from quartz. PUREVAP reduces the quartz with carbon using a plasma submerged arc. Under vacuum, and at very low operating pressure, the silicon is refined in a one-step process removing all impurities and transforming it to its purest form, resulting in a high purity silicon. The Licensor expects that the silicon grades produced by PUREVAP will, when commercialized, be used for different applications, including solar energy.

The PUREVAP Nano Silicon Reactor (NSiR) is designed to transform silicon into spherical silicon nanopowders and nanowires for use in lithium-ion batteries. The new proprietary process is designed to be highly scalable and will eventually allow the production of silicon nanopowders in large quantities at a competitive cost with other materials used in the lithium-ion space. The PUREVAP Nano Silicon Reactor can use different purities of silicon as feedstock.

A PUREVAP pilot system is capable of producing 200-metric tonnes per year of silicon metal directly from quartz.

Field of Use
Field of use is for the use in lithium-ion batteries.

Licensee is developing the PUREVAPTM QRR and the PUREVAPâ„¢ SiNR, two new innovative plasma-based processes which will permit the low-cost manufacturing of High Purity Silicon Metal, Spherical Nano-powders and Nanowires for Next-Generation Lithium-ion Batteries.

IPSCIO Record ID: 480

License Grant
The Licensor  hereby grants a sole and exclusive, worldwide, royalty-bearing right and license under the Licensed Patent Applications and the Licensed Patents to make, have made, use, sell, offer for sale, lease and otherwise dispose of Licensed Products in the Licensed Territory in the Licensed Field of Use.  Licensee accepts the terms and conditions required for sublicensees as outlined in the UC License.
License Property
Licensed Product, singular or plural, shall mean any Atmospheric Pressure Plasma Jet Technology wherein the manufacture, use, offer for sale, sale or importation of Atmospheric Pressure Plasma Jet Technology by Licensee would, but for the rights and license granted herein, constitute an infringement of a valid and enforceable claim of a subsisting Licensed Patent and shall not include Licensee's standard power delivery equipment (i.e., stand alone Licensee's power supplies and match networks) but includes power generation and delivery equipment which is designed specifically as an integral and indivisible part of the Atmospheric Pressure Plasma Jet Technology.

'Deposition Process Technology' means processes for depositing compositions of matter, including Deposition Precursor Technology, onto substrates using Deposition Plasma Jet Technology.  Plasmas have been used extensively in a wide variety of industrial and high technology applications, from semiconductor fabrication to coatings of reflective films for window panels and compact disks.

Surface cleaning is a fundamental requirement for many industrial processes. It is also important for decontamination of objects. Traditionally, surface cleaning has been accomplished using solvent-based methods, technologies which have been available for more than 100 years. Increasing concerns about ground water and air pollution, greenhouse gases, and related health and safety issues have severely restricted the use of common volatile organic solvents, and even many of the recently-adapted, less hazardous chemical substitutes.  Plasmas have been used extensively in a wide variety of industrial and high technology applications, from semiconductor fabrication to coatings of reflective films for window panels and compact disks. Plasmas ranging in pressure from high vacuum (<0.1 mTorr) to several Torr are most common, and have been used for film deposition, reactive ion etching, sputtering and other forms of surface modification. The primary advantage of plasma cleaning is that it is an 'all-dry' process, generates minimal effluent, does not require hazardous pressures, and is applicable to a wide variety of vacuum-compatible materials, including silicon, metals, glass, and ceramics.

Field of Use
'Licensed Field of Use shall mean all fields in which Licensee can demonstrate that it is one of the top three leading vendors in market share in each of such fields, as demonstrated by dollar volume of sales in the preceding year, including but not limited to Semiconductor Processing, Data Storage (including but not limited to magnetic and optical), Flat Panel and Electronic Displays, and Architectural Glass, and in any other field mutually agreed upon.
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