Category: Technology Licenses
Created On: 2022-04-28
Record Count: 8
- Material Composite
- Technical Know How
IPSCIO Report Record List
Below you will find the records curated into this collection. This summary includes the complete licensed property description so that you can review and determine if this collection covers the topics, technology or transaction type that is relevant for your needs. The full report will include all relevant deal data such as the royalty base, agreement date, term description, royalty rates and other deal terms. For reference, here is a sample of a full IPSCIO curated royalty rate report: Sample Report
IPSCIO Record ID: 203471
Licensed product shall mean a cryogenic receiver front-end device for wireless communications networks which contains a thin film radio frequency filter manufactured using high-temperature superconducting materials and either pulsed energy deposition or pulsed laser deposition. A list of the current Licensed products of Licensee, is set forth. Additional Licensed products may be added to this list by Licensee upon written notice to Licensor.
Licensed equipment shall mean an apparatus performing pulsed energy deposition and/or pulsed laser deposition claimed in the Licensed patent.
IPSCIO Record ID: 215209
For the non-exclusive license, Licensor grants a nonexclusive, nonsublicensable, perpetual license under its Proprietary Rights in Licensors Technology for magnetic quadrapole and magnetic sensing applications for underwater and underground object detection applications, including patent(s), to use, make, have made, market and sell Licensed Products only to the Permitted Market.
The Permitted Market will mean the U.S. government or any state, local or foreign government or any agency, department, bureau or other subdivision or instrumentality thereof, except that the foreign market will be limited to military, intelligence and law enforcement entities.
Cryoelectronics or cryolectronics is the study of superconductivity under cryogenic conditions and its applications.
Patent No. Title Rights of Others
———- —– —————-
5,090,819 Superconducting Bolometer
5,157,466 Grain Boundary Junctions in HTS Films
5,207,884 Superconductor Deposition System
5,219,826 Superconducting Junctions and Method of Making Same
5,241,828 Cryogenic Thermoelectric Cooler
5,280,013 Method of Preparing HTS Films on Opposite Sides of a Substrate
5,449,659 Method of Bonding Multilayer Structures of Crystalline Materials
5,130,294 High Temperature Superconductor – Calcium Titanate Sapphire Structures
5,131,282 High Temperature Superconductor – Strontium Titanate Sapphire Structures
5,233,500 Package for Cascaded Microwave Devices
5,651,016 Ultrahigh Speed Laser
5,696,392 Improved Barrier Layers for Oxide Superconductor Devices and Circuits
5,831,278 Three-Terminal Devices with Wide Josephson Junctions and asymmetric Control Lines
IPSCIO Record ID: 286021
(a) U.S. Patent 4,710,030, Optical generator and detector of stress pulses.
(b) U.S. Patent 5,706,094, Ultrafast optical technique for the characterization of altered materials
(c) U.S. Patent 5,864,393, Optical method for the determination of stress in thin films.
(d) U.S. Patent 5,748,317, Apparatus and method for characterizing thin film and interfaces using an optical heat generator and detector.
(e) U.S. Patent 5,748,318, Optical stress generator and detector.
(f) U. S. Patent 5,844,684, Optical method for determining the mechanical properties of a material.
Licensed Product shall not, however, include (i) replacement parts provided or sold to end-users after the initial system is delivered; (ii) all software provided after delivery which does not provide additional functional capabilities which incorporates the claims of the Patent Rights; (iii) software upgrades or revisions which do not provide additional functional capabilities which incorporates the claims of the Patent Rights; (iv) service and maintenance of hardware and/or software and peripherals to the system. For purposes of this Agreement, a product shall be deemed a Licensed Product if such product is covered, in whole or in part, by at least one Patent Right in one country, whether or not that product is made, used or sold within that country. For example, an instrument system that incorporates one of the claims of U.S. Patent 4,710,030 would be a Licensed Product and would be subject to a royalty payment if sold in Japan, even though there is no issued patent in Japan.
Metal and Opaque Thin Film Measurement Solutions. Licensee's MetaPULSE family of metrology systems incorporates our proprietary technology for optical acoustic metrology, which allows customers to simultaneously measure the thickness and other properties of up to six metal or other opaque film layers in a non- contact manner on product wafers. By minimizing the need for test wafers, MetaPULSE enables Licensee's customers to achieve significant cost savings. Licensee believe that Licensee currently offer the only systems that can non-destructively measure up to six metal film layers with the degree of accuracy semiconductor device manufacturers demand. Licensee's MetaPULSE systems use ultra-fast lasers to generate sound waves that pass down through a stack of metal or opaque films such as copper and aluminum, sending back to the surface an echo which is detected and analyzed. These systems precisely measure the films with Angstrom accuracy and sub-Angstrom repeatability at high throughputs. This accuracy and repeatability is critical to semiconductor device manufacturers' ability to achieve higher manufacturing yields with the latest fabrication processes.
IPSCIO Record ID: 89738
Licensed Claims shall mean any and all non-Equipment claims entitled to priority to U.S. Serial No. 09/227,679 and/or 60/070,991, including, without limitation, non-Equipment claims in U.S. Patent Nos. 6,749,687 and 7,105,055.
6,749,687 – In situ growth of oxide and silicon layers
7,105,055 – In situ growth of oxide and silicon layers
The lead technology, named Mears Silicon Technologyâ„¢, or MSTÂ®, is a thin film of reengineered silicon, typically 100 to 300 angstroms (or approximately 20 to 60 silicon atomic unit cells) thick. MSTÂ® can be applied as a transistor channel enhancement to CMOS-type transistors, the most widely used transistor type in the semiconductor industrry.
IPSCIO Record ID: 480
'Deposition Process Technology' means processes for depositing compositions of matter, including Deposition Precursor Technology, onto substrates using Deposition Plasma Jet Technology. Plasmas have been used extensively in a wide variety of industrial and high technology applications, from semiconductor fabrication to coatings of reflective films for window panels and compact disks.
Surface cleaning is a fundamental requirement for many industrial processes. It is also important for decontamination of objects. Traditionally, surface cleaning has been accomplished using solvent-based methods, technologies which have been available for more than 100 years. Increasing concerns about ground water and air pollution, greenhouse gases, and related health and safety issues have severely restricted the use of common volatile organic solvents, and even many of the recently-adapted, less hazardous chemical substitutes. Plasmas have been used extensively in a wide variety of industrial and high technology applications, from semiconductor fabrication to coatings of reflective films for window panels and compact disks. Plasmas ranging in pressure from high vacuum (<0.1 mTorr) to several Torr are most common, and have been used for film deposition, reactive ion etching, sputtering and other forms of surface modification. The primary advantage of plasma cleaning is that it is an 'all-dry' process, generates minimal effluent, does not require hazardous pressures, and is applicable to a wide variety of vacuum-compatible materials, including silicon, metals, glass, and ceramics.
IPSCIO Record ID: 26122
IPSCIO Record ID: 28421
Licensed Product means any of the items described in the following clauses (a) through (d) and/or parts thereof (a) Semiconductive Material;(b) Auxiliary Part; (c) Semiconductor Product; or (d) Manufacturing Apparatus.
Semiconductor Product means (a) a Semiconductive Element; or (b) a Semiconductive Element and one or more films of conductive, semiconductive or insulating materials formed on a surface or surfaces of such Semiconductive Element, said film or films comprising one or more conductors, active or passive electrical circuit elements or any combination thereof.
IPSCIO Record ID: 328
The parties agree that the definition of Products includes subsystems related to the products (e.g. the Nison Vesper submodule) only to the extent such subsystems are incorporated in Products sold by Licensee to end-users of the Products and not to original equipment manufacturers. Three products are covered by this agreement Spin Processor CENOTE, a single wafer wet station; Best, a wafer backside3 etcher, and Wet Station, an immersion process system.
Method of recirculation of high temperature etching solution
Cleaning/ rinsing vessel for semiconductor wafer
Method for refinig etchant
Single wafer spin etching method
Etching method with hot phosphoric acid
Composition measuring method for buffered hydrofluoric acid for semiconductor wafer etching
Regeneration treatment apparatus for etchant and etching apparatus using the same
Filter device with bellows damper and chemicalâ€“circulation treatment device for semiconductor wafer using the same
Semiconductor wafer cleaning system
Method of etching semiconductor wafer
Device and method for etching semiconductor wafer
Scrub cleaning device
Cleaning Equipment of wafer
Equipment and method for processing solution for semiconductor wafer
The apparatus and the method of etching wafer
The apparatus of reclaiming etching liquid and method and apparatus of etching
The method of controlling the boiling chemical
The apparatus and the method of floating wafer chuck
The apparatus of wafer treatment and shaft
Etching method and equipment
Processing method and processing device before wafer inspection
Processing method and processing device before wafer inspection
Method for recirculating highâ€“temperature etching soluthin
Method for purification of etching solution
The apparatus of filtering recirculation etching liquid and other chemical machines and instruments
Automatic fluidâ€“ composition control machines and instruments
The apparatus of wafer etching, chemical machines and instruments
The machines of chemical reaction and machines of separation, the chemical reclaiming etching apparatus, and other chemical machine and instruments.
Remark An application shall designate one or more items of goods on which the trademark is to be used, in one class of the classification of goods, prescribed by Cabinet Order.
Spin Processor CENOTE
Single Wafer Wet Station
Wafer Backside Etcher
Immersion Process System