Royalty Report: Semiconductors, Fabrication, Solar – Collection: 189170

$150.00

Curated Royalty Rate Report
Category: Technology Licenses, Created On: 2022-04-28, Record Count: 13

Description

This collection of transactions and supporting information was developed using our AI algorithm to curate similar royalty reports into a cohesive collection to support your licensing, transfer pricing or other transaction scenarios where documented royalty rates and/or deal terms are important.
Category: Technology Licenses
Created On: 2022-04-28
Record Count: 13

Primary Industries

  • Semiconductors
  • Fabrication
  • Solar
  • Electrical & Electronics
  • Material Composite
  • Energy Resources & Svcs
  • Alternative and Renewable Energy
  • Technical Know How
  • Business Method
  • Coating

IPSCIO Report Record List

Below you will find the records curated into this collection.  This summary includes the complete licensed property description so that you can review and determine if this collection covers the topics, technology or transaction type that is relevant for your needs.  The full report will include all relevant deal data such as the royalty base, agreement date, term description, royalty rates and other deal terms.  For reference, here is a sample of a full IPSCIO curated royalty rate report: Sample Report

IPSCIO Record ID: 189170

License Grant
The University and Licensee entered an exclusive license to make, have made, use, sell, or any combination of the Licensed Products and Licensed Processes in the Field of Use and the Licensed Territory.  Additionally Licensor granted to Licensee a limited exclusive eighteen month option to license Optioned Technologies Patent Rights.
License Property
The Licensed Technologies Patent Rights are for Compounds Containing Tetra-deca-chloro-cyclo-hexasilane Dianion; Method of Forming Functionalized Silanes; Method of Producing Polyalkylated Oligoalkylenepolyamines; and Method of Producing Cyclohexasilane Compounds.

The Optioned Technologies Patent Rights are for Liquid Silane-Based Compositions and Methods for Producing Silicon-Based Materials; Liquid Silane-Based Compositions and Methods of Fabrication; Method and Apparatus for Aerosol Direct Write Printing; Synthesis of Silicon Containing Materials Using Liquid Hydrosilane; Compositions through Direct Injection; Silicon Materials from the Processing of Liquid Silanes and Heteroatom Additives; Synthesis of SI-Based Nano-Materials using Liquid Silanes; Production of 1-Dimensional Supramolecular Assemblies Comprised of Cyclopentasilane and  Cyclohexasilane Rings Linked by Atoms, Molecules, and Ions; and Surface Modified Silicon Quantum Dots.

Field of Use
Licensee creates technology based solutions, products and services, that address energy-related market needs globally.  Licensees underlying technology is based on the production of a high value liquid silicon precursor, cyclohexasilane, CHS, for materials commonly used for manufacturing silicon-based semiconductors and solar cells.

IPSCIO Record ID: 27206

License Grant
The Company agrees to grant to a Korean company the right to a processes involving technology, equipment design, and other intangible assets and property rights of value, all of which are useful with respect to the manufacture of Silicon Wafers.
License Property
The Company has developed over the years and possesses processes involving technology, equipment design, and other intangible assets and property rights of value, all of which are useful with respect to the manufacture of Silicon Wafers (as hereinafter defined) and certain value added features such as epitaxial layers.
Field of Use
Field of this Agreement means Silicon Wafers and processes, apparatus, equipment, and materials useful in producing Silicon Wafers consistent with the commercial requirements of PHC.

The Field of this Agreement shall not include processes, apparatus, equipment, and materials useful in producing polycrystal Silicon.

IPSCIO Record ID: 26099

License Grant
University grants to Licensee an exclusive license under the Rice Intellectual Property to make, have made, use, import, offer for sale, sell, lease, or otherwise transfer the University's Licensed Products in the Field of Use in the Territory.
License Property
University is the owner of certain inventions, know-how and rights pertaining to the synthesis of uniform nanoparticle shapes with high selectivity, including without limitation all rights pursuant to the patent applications and issued patents listed.

Synthesis of Uniform Nanoparticle Shapes with High Selectivity – 60/911,721

Synthesis of Uniform Nanoparticle Shapes with High Selectivity 12/442,382

The Licensor is the owner of certain inventions and patent applications, know-how and rights pertaining to the synthesis of uniform nanoparticle shapes with high selectivity.
A Quantum Dot is a nanocrystal made of semiconductor materials that are small enough to exhitit quantum mechanial properties.

Nanoparticle are materials with features in the nanoscale, which features can be beneficial in a number of applications. Quantum dots are atomic crystals, tiny nanoparticles which can operate as up converters or down converters, emitting either photons or electrons when excited. The color of light emitted varies depending on the size of the quantum dot so that photonic emissions can be tuned by the creation of quantum dots of different sizes. Their unique properties as highly efficient, next generation semiconductors have led to the use of quantum dots in a range of electronic and other applications, including in the biomedical, display and lighting industries. Quantum dots also have applications in solar cells, where their characteristics enable conversion of light energy into electricity, with the potential for significantly higher efficiencies and lower costs than existing technologies, thereby creating the opportunity for a step change in the solar energy industry through the use of quantum dots in printed photovoltaic cells.

Field of Use
'Field of Use' means the manufacture and sale of quantum dots for electronic and medical applications. For the purposes of this Agreement, electronic applications shall exclude photovoltaic applications.

The Licensee is a nanotechnology company which designs, develops, produces, and supplies tetrapod quantum dots. The company’s tetrapod quantum dots are high performance variants of quantum dots that are nanoparticles of a semiconductor material, which emit light or fluoresce, when excited with energy. Its products are used for a range of applications in the life sciences, optoelectronics, photovoltaics, lighting, security ink, and sensor sectors.

IPSCIO Record ID: 368499

License Grant
Licensor of England, grants
—  an exclusive license under Licensed Patents to make, have made, use, sell and import PolyFluorene Based Materials in any and all countries of the world. This license includes process technology relating to the Suzuki Coupling reaction;

—  a non-exclusive license under Licensed Patents for all process technology relating to the Suzuki coupling reaction for use in making materials other than PolyFluorene Based Materials in any and all countries of the world;

—  a non-exclusive license under Licensor Patents to make, have made, use, sell and import PF Ink Jet Formulations in any and all countries of the world, provided that such Intellectual Property is wholly-owned and free to be licensed as of the date of this Agreement, or for later made inventions, as of the date of the invention;

—  a non-exclusive license under Licensor Patents relating to Spiro and IndenoFluorones to make, have made, use, sell or import LEPs containing spiro and indenofluorenes in any and all countries of the world, provided that those patents are wholly-owned and free to be sublicensed as of the date of this Agreement, or for later made inventions, as of the date of the invention; and

—  a non-exclusive license under Licensors intellectual property to make test devices for screening and developing new materials.

License Property
Licensor has the right to grant licenses under certain patents and Know-how relating to polyfluorene-based materials.

LEP means light emitting polymer relating to large molecule organic electroluminescent material.

Polyfluorene-Based Material means Polyfluorenes;  solid compositions containing Polyfluorenes in an amount of at least 1% by weight; and solutions containing Polyfluorenes not including formulations for ink jetting.

PF Ink Jet Formulations Means solutions containing Polyfluorenes for ink jet application.

Field of Use
The Parties are developing polymers for use in LEP displays, which are organic light-emitting displays (OLEDs).
OLED displays are expected to be deployed in instrument panels and portable electronics such as mobile phones and personal digital assistants, and eventually larger displays for personal computers and consumer products, where they could overtake liquid-crystal display (LCD) technology in the future.

As an emissive display, LEPs need no backlight, which means they can be thinner and lighter than LCDs, as well as more power-efficient. LEP displays are also brighter with richer color, offering sharp, high-contrast images that can easily be viewed from acute angles. Additionally, LEPs in liquid form are unique in that they can be ink-jet printed on glass and plastic, which is a technology advantage that could significantly change the way displays are produced and open new markets and opportunities.

The field of use is semiconductors and related devices.

IPSCIO Record ID: 203395

License Grant
Licensor grants a worldwide, nonexclusive license, revocable within limitations, under Licensors trade secret rights in the Licensed Process to make, import, export and sell Licensed Products.

Concurrently with this Agreement, the Parties are entering into an agreement defining the joint development of an enhanced process for implanting silicon wafers with oxygen and/or other ions and annealing such wafers.

License Property
Licensor has developed an improved method of implantation and annealing.

The Licensed Process shall mean the process for Implanting silicon wafers with oxygen and annealing, as practiced for commercial production in Licensors New York state facility, referred to as Routes 7NOO, 7VOO, 7AOO and 2VOO. Licensor represents that the twenty (20) wafers delivered to Licensee on or about November 10, 2000 were Implanted and annealed with the Licensed Process. The Licensed Process shall include Licensor Improvements only if such Improvements are subsequently licensed to Licensee. The Licensed Process shall further include the Enhanced Process, as defined in the Joint Development Agreement.

'Licensed Product' shall mean (a) silicon wafers or substrates implanted with oxygen and annealed according to, with the aid of, based on or using information disclosed hereunder (including the Licensed Process) that, as of the date of disclosure, is not excluded from the obligations of confidentiality by the provisions of Section 4.6; and (b) semiconductor devices and integrated circuits formed on silicon substrates licensed according to the preceding clause.

Field of Use
The Licensee has expertise in products for the implantation and annealing of semiconductor wafers with oxygen.

IPSCIO Record ID: 145414

License Grant
The License from the Licensor is exclusive and worldwide until a certain royalty has been  paid.
License Property
This licensing  agreement covers the manufacture and sale of SiC wafers worldwide under the technical direction of the Russian scientists who developed the technology.  

Silicon carbide (SiC), also known as carborundum is a semiconductor containing silicon and carbon.

SiC is unique in that  semiconductor devices made from it can operate at high temperatures, high voltages and high frequencies, and it can enable electro-optical  applications in the blue light spectrum.

Field of Use
Licensee SiC production process includes the Licensor  technology.

IPSCIO Record ID: 280974

License Grant
Licensor and German Licensee are parties to certain litigation involving the 761 patent.

With this interim patent license, the Licensor grants to the German Licensee a non-exclusive, non transferable worldwide license under the Patent Rights, without the right to grant sublicenses, to make, have made, use, sell, offer for sale, and import Licensed Products during the Term of this Agreement.

License Property
Licensor is the owner of patents relating to wet processing of semiconductors.

Licensed Products shall mean drying equipment, wet bench products, and replacement parts .

Dryer Module shall mean drying equipment in an enclosed, self-contained, physically separate unit which performs rinsing and drying but no chemical treatment operation.

Field of Use
The field of use is the semiconductor wet processing business.

IPSCIO Record ID: 328

License Grant
Japanese Licensor hereby grants to Licensee the exclusive License under the Patents, Technical Information and Intellectual Property Rights to manufacture, use, offer for sale, sell, import and/or lease the Products in the territory; provided, however, Licensee agrees not to manufacture any of the three Products listed in this Agreement at any time on or prior to June 30, 2006; provided further, however, that Licensee may start on the effective date to manufacture, use, offer for sale, sell, import and/or lease in the territory all subsystems related to any Products, including, but not limited to, the Nison Vesper submodule. For the avoidance of doubt, Licensor acknowledges and agrees that the License granted to Licensee under this Agreement includes the right of the Licensee to subLicense to any purchaser of the Products the right to use (but not manufacture) the Patents, Technical Information and Intellectual Property Rights.
License Property
Licensor was incorporated to, among other things, manufacture and distribute certain products and systems of Licensee in Japan in accordance with a Shareholders Agreement dated June 5, 1991.  This license is a result of Licensor buying a portion of the business of a semiconductor manufacturing equipment business and licensing back rights to Licensee.

The parties agree that the definition of Products includes subsystems related to the products (e.g. the Nison Vesper submodule) only to the extent such subsystems are incorporated in Products sold by Licensee to end-users of the Products and not to original equipment manufacturers.  Three products are covered by this agreement Spin Processor CENOTE, a single wafer wet station; Best, a wafer backside3 etcher, and Wet Station, an immersion process system.

Patent

Title
No.
number

number
Country

1
Method of recirculation of high temperature etching solution
63–248757
02–096334

1653241
Japan

2
Cleaning/ rinsing vessel for semiconductor wafer
03–350731
05–166787

2013691
Japan

3
Method for refinig etchant
05–253672
07–086260

3072876
Japan

4
Single wafer spin etching method
07–104581
08–279485

3459137
Japan

5
Etching method with hot phosphoric acid
07–216528
09–045660

3459141
Japan

6
Composition measuring method for buffered hydrofluoric acid for semiconductor wafer etching
07–163075
08–334461

N/A
Japan

7
Regeneration treatment apparatus for etchant and etching apparatus using the same
10–095836
11–293479

N/A
Japan

8
Cleaning apparatus
11–199868
2001–028356

N/A
Japan

9
Filter device with bellows damper and chemical–circulation treatment device for semiconductor wafer using the same
11–222204
2001–046815

N/A
Japan

10
Semiconductor wafer cleaning system
11–234855
2001–060574

N/A
Japan

11
Method of etching semiconductor wafer
11–271065
2001–093876

N/A
Japan

12
Device and method for etching semiconductor wafer
11–314794
2001–135611

N/A
Japan

13
Scrub cleaning device
2000–044343
2001–237209

N/A
Japan

14
Cleaning Equipment of wafer
2000–274592
2002–093764

N/A
Japan

15
Equipment and method for processing solution for semiconductor wafer
2001–009915
2002–217165

N/A
Japan

16
Wafer–cleaning device
2001–158580
2002–353183

N/A
Japan

17
The apparatus and the method of etching wafer
2002–42120
2003–243353

N/A
Japan

18
The apparatus of reclaiming etching liquid and method and apparatus of etching
2002–269405
N/A

N/A
Japan

19
The method of controlling the boiling chemical
2002–318730
2004–153164

N/A
Japan

20
The apparatus and the method of floating wafer chuck
2002–108651
2003–303871

N/A
Japan

21
The apparatus of wafer treatment and shaft
2003–47148
N/A

N/A
Japan

22
Etching method and equipment
2002–324795
2004–158746

N/A
Japan

23
Processing method and processing device before wafer inspection
2001–266653
2003–75312

N/A
Japan

24
Processing method and processing device before wafer inspection
2002–156835
2003–344243

N/A
Japan

25
Method for recirculating high–temperature etching soluthin
412444
N/A

4980017
USA

26
Method for purification of etching solution
305334
N/A

5470421
USA

Trademarks

Class of

NO
Trademark
goods
Designated goods

1 NISON
7
The apparatus of filtering recirculation etching liquid and other chemical machines and instruments

2 NISON
9
Automatic fluid– composition control machines and instruments

3 CENOTE
7
The apparatus of wafer etching, chemical machines and instruments

4 Stelna
7
The machines of chemical reaction and machines of separation, the chemical reclaiming etching apparatus, and other chemical machine and instruments.

Remark An application shall designate one or more items of goods on which the trademark is to be used, in one class of the classification of goods, prescribed by Cabinet Order.

Product
Product Name

Description

Spin Processor CENOTE
Single Wafer Wet Station

Best

                Wafer Backside Etcher

Wet Station

Immersion Process System

Field of Use
Products means any and all products, systems and subsystems now or hereafter produced by or under control of Licensee based upon the Technical Information given under this Agreement which are in the field of surface conditioning, cleaning, etch and stripping technology such as the Technical Information used in the products to this Agreement and any products, systems and subsystems to be used in the Field which will be developed, designed or invented, or otherwise acquired by Licensor in the future during the term of this Agreement.

IPSCIO Record ID: 367357

License Grant
The parties entered into discussions in March 2007 and signed an LOI in May 2007 to align their interests with respect to the development and sale by Licensor of a workflow for Wets Processing as contemplated in this Agreement.  The Parties entered into the Alliance Agreement and began working on a collaborative development program directed at a cleans application.

This Agreement sets forth terms and conditions under which Licensee may sell to Licensor one or more Wets Workflows, and the terms and conditions under which Licensor may provide related Services.

Licensor grants to Licensee all right, title, and interest in and to Licensee Technology.

License Property
As between the Parties, Licensor shall be the sole owner of all right, title, and interest in and to
– the Licensor Independent Technology,
– Intellectual Property Rights; relating to Materials or Products and methods of using Materials or Products,
– Metrology/Characterization Technology that is not HPC Technology, and
– Materials Manufacturing Technology, and improvements to any of the foregoing (Licensor Technology) derived through Licensors use of the Wets Workflow purchased herein.

As between the Parties, Licensee shall he the sole owner of the Licensee Independent IP, Metrology/ Characterization Technology that is HPC Technology, HPC Technology, and any improvements to any of the foregoing (Licensee Technology).

Agreement WF Compound means any Lead WF Compound or Derivative WF Compound.  Lead WF Compound means a compound or material identified, first synthesized, or discovered in whole or in part through use of any Wets Workflow provided through this Agreement.

Product means a Material that incorporates an Agreement WP Compound or utilizes an Agreement WF Compound in its manufacture and/or methods of using the same.

Equipment means Wets Workflow hardware tools (excluding Informatics Hardware) that may be sold pursuant to this Agreement, conforming to the Specifications set forth in the Purchase Documentation.

HPC Technology means all techniques, methodologies, processes, test vehicles, synthetic procedures, technology, systems, or combination thereof (collectively, Techniques)
–  subject to or covered by any Intellectual Property Right owned by Licensee or licensed to Licensee,
–  provided by Licensee to Licensor and
–  used for the simultaneous parallel or rapid serial design, synthesis, processing, process sequencing, process integration, device integration, analysis, or characterization of more than two compounds, compositions, mixtures, processes, or synthesis; conditions, or the structures derived from such.

Field of Use
The field of use applications include Post-CMP Cleans (Cu); Post Etch Dielectric Contact Clean; TDDB Dielectric Enhancement Layers; All wet solution for HDIS; Reclaim (SiC); HDA replacement, and other related Wets workflow opportunities in the semiconductor industry.

Wets Processing means a set of operations for the development or application of liquid or fluid-based Materials, which Materials are used in semiconductor manufacturing for cleaning, etching, or electro less deposition.

Wets Work flow means the combination of one or more of the following as described in the applicable Quote Equipment; Informatics Hardware; Third Party Software and/or Informatics Software; an HPC Site License.

IPSCIO Record ID: 237238

License Grant
Licensor, an individual, grants to Licensee, its successors, assigns, and legal representatives, the irrevocable, world-wide right and license in and to the Technology and the Licensed Patents, including the right to make, have made, use, lease, sub-license and sell Wafers, Cells, Modules, Integrated Products and Other Products and to enforce any of the patent rights of the Licensed Patents.
License Property
Licensee owns or has rights in and to certain patents, patent rights, knowhow and technology relating to ribbon technology.

Wafer shall mean any ribbon substrate which would infringe a claim of a Licensed Patent.

Cell shall mean a single Wafer which is processed to provide electrical output.

Module shall mean a plurality of Cells which are connected with a common electrical output.

Integrated Product shall mean any product which is sold as a unit by Licensee and which incorporates a Wafer, Cell or Module as part of the unit.

Field of Use
Licensee is engaged in the development and marketing of products which incorporate ribbon technology, such as crystalline silicon photovoltaics and photovoltaic solar cells.

IPSCIO Record ID: 116322

License Grant
Licensor grants to the Japanese Licensee and its Affiliates an irrevocable license to utilize the Technology in connection with Licensors and its Affiliates use of the SIMOX Implanter and any additional Licensor oxygen implanters purchased or leased by Licensee for the purpose of manufacturing SIMOX Wafers.

The Japanese Licensee is purchasing from Licensor an 1000 SIMOX Implanter.

License Property
The SIMOX Implanter is the 210keV, 60mA 0+ 1000 Implanter with fill automated cassette load lock purchased by Licensee from Licensor.

SIMOX Wafers means polished, single-crystalline silicon wafers into which oxygen ions are implanted by the SIMOX Implanter or any additional Licensor oxygen implanter purchased or leased by Licensee utilizing the Standard SIMOX and/or Advantox-TM- processes.

Separation by implantation of oxygen (SIMOX), is a form of silicon-on-insulator (SOI) technology that creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing.

Field of Use
This agreement is for the semiconductor industry.

IPSCIO Record ID: 26585

License Grant
University grants to Licensee an exclusive license under the Rice Intellectual Property to make, have made, use, import, offer for sale, sell, lease, or otherwise transfer University's Licensed Products in the Field of Use in the Territory, with the right to sub-license, during the Term of this Agreement.
License Property
University is the owner of certain inventions, know-how and rights pertaining to the synthesis of uniform nanoparticle shapes with high selectivity, including without limitation all rights pursuant to the patent applications and issued patents listed.

Synthesis of Uniform Nanoparticle Shapes with High Selectivity – 60/911,721

Synthesis of Uniform Nanoparticle Shapes with High Selectivity 12/442,382

The Licensor is the owner of certain inventions and patent applications, know-how and rights pertaining to the synthesis of uniform nanoparticle shapes with high selectivity.
A Quantum Dot is a nanocrystal made of semiconductor materials that are small enough to exhibit quantum mechanial properties.

Nanoparticle are materials with features in the nanoscale, which features can be beneficial in a number of applications. Quantum dots are atomic crystals, tiny nanoparticles which can operate as up converters or down converters, emitting either photons or electrons when excited. The color of light emitted varies depending on the size of the quantum dot so that photonic emissions can be tuned by the creation of quantum dots of different sizes. Their unique properties as highly efficient, next generation semiconductors have led to the use of quantum dots in a range of electronic and other applications, including in the biomedical, display and lighting industries. Quantum dots also have applications in solar cells, where their characteristics enable conversion of light energy into electricity, with the potential for significantly higher efficiencies and lower costs than existing technologies, thereby creating the opportunity for a step change in the solar energy industry through the use of quantum dots in printed photovoltaic cells.

Field of Use
'Field of Use' means the manufacture and sale of photovoltaic cells and the manufacture and sales of quantum dots for photovoltaic applications.

Licensee shall demonstrate a working model of a thin film quantum dot solar cell product using the University's Intellectual Property by April 30, 2010. This working model shall achieve 6% efficiency at a manufactured cell cost of <$1.50/Watt, and have a consumer warranty regarding product lifetime performance comparable to existing photovoltaics.

IPSCIO Record ID: 27747

License Grant
The Licensor grants to Licensee and its Affiliates the exclusive right and license, to make, have made, use, import or sell, including but not limited to in combination with Licensee’s intellectual property, the Licensed Products worldwide, subject to the patent coverage of the Licensed Patents, including the right to grant Sublicenses.
License Property
The Licensor has developed certain inventions pertaining to the production of silicon wafers using a nanocatalytic wet-chemical etch.

“Nanoparticle-Based Etching of Silicon Surfaces” 12/053,372
“Anti-reflection Etching of Silicon Surfaces Catalyzed with Ionic Metal Solutions”12/053,445
“Wet-Chemical Systems and Methods for Producing Black Silicon Substrates”PCT/US10/56417
“Efficient Black Silicon Photovoltaic Devices with Enhanced Blue Response”PCT/US11/27479

Field of Use
The Field involves Equipment and Chemicals to produce photovoltaic cells.

“7AC Field” means the field of (A) combination photovoltaic and solar thermal modules that provide both electricity and hot liquid, and/or (B) any system that uses combination photovoltaic and solar thermal modules that provide both electricity and hot liquid whereby the hot liquid is used for hot liquid dehumidification. The term “hot liquid” specifically excludes hot air.

“Liquid-Phase-Deposited Passivation” means passivation of photovoltaic cell by applying a liquid to the silicon surface, wherein the liquid produces a surface coating layer that provides passivation, with or without subsequent annealing steps.

Licensee is interested in acquiring certain rights to Licensor's Inventions and plans develop and commercialize a line of products related to the production of Black Silicon. The photovoltaic cells integrating the Licensed Intellectual Property using diffused emitter and Liquid-Phase-Deposited Passivation.

Disclaimer: The information gathered from RoyaltySource® database was sourced from the U.S. Securities and Exchange Commission EDGAR Filings and other public records. While we believe the sources to be reliable, this does not guarantee the accuracy or completeness of the information provided. Further, the information is supplied as general guidance and is not intended to represent or be a substitute for a detailed analysis or professional judgment. This information is for private use only and may not be resold or reproduced without permission.